Publications and References
Scientific publications, conference contributions, acknowledged support and non-confidential references reflecting NT&D’s technical background, collaborations and long-standing engagement in advanced technology projects.
Papers, proceedings and technical publications
Broadband transmission grating spectrometer for measuring the emission spectrum of EUV sources
M. Bayraktar, B. Bastiaens, C. Bruineman, B. Vratzov, F. Bijkerk
NEVAC blad, 54(1), 14–19, 2016.
Fabrication and characterization of free-standing, high-line-density transmission gratings for the vacuum UV to soft X-ray range
S. J. Goh, H. M. J. Bastiaens, B. Vratzov, Q. Huang, F. Bijkerk, K. J. Boller
Optics Express, 23(4), 4421–4434, 2015. DOI: 10.1364/OE.23.004421.
High-frequency acoustic charge transport in GaAs nanowires
S. Büyükköse, A. Hernández-Mínguez, B. Vratzov, C. Somaschini, L. Geelhaar, H. Riechert, W. G. van der Wiel, P. V. Santos
Nanotechnology, 25, 135204, 2014. DOI: 10.1088/0957-4484/25/13/135204.
Single-order operation of lamellar multilayer gratings in the soft x-ray spectral range
R. van der Meer, I. Kozhevnikov, B. Krishnan, J. Huskens, P. Hegeman, C. Brons, B. Vratzov, B. Bastiaens, K. Boller, F. Bijkerk
AIP Advances, 3, 012103, 2013. DOI: 10.1063/1.4774297.
Ultrahigh-frequency surface acoustic wave generation for acoustic charge transport in silicon
S. Büyükköse, B. Vratzov, J. van der Veen, P. V. Santos, W. G. van der Wiel
Applied Physics Letters, 102, 013112, 2013. DOI: 10.1063/1.4774388.
Flexible thin-film transistors using multistep UV nanoimprint lithography
P. F. Moonen, B. Vratzov, W. T. T. Smaal, B. K. C. Kjellander, G. H. Gelinck, E. R. Meinders, J. Huskens
Organic Electronics, 13(12), 3004–3013, 2012. DOI: 10.1016/j.orgel.2012.09.001.
Ultrahigh-frequency surface acoustic wave transducers on ZnO/SiO₂/Si using nanoimprint lithography
S. Büyükköse, B. Vratzov, D. Ataç, J. van der Veen, P. V. Santos, W. G. van der Wiel
Nanotechnology, 23, 315303, 2012. DOI: 10.1088/0957-4484/23/31/315303.
Improved resolution for soft-x-ray monochromatization using lamellar multilayer gratings
R. van der Meer, B. Krishnan, I. V. Kozhevnikov, M. J. de Boer, B. Vratzov, H. M. J. Bastiaens, J. Huskens, W. G. van der Wiel, P. E. Hegeman, G. C. S. Brons, K. J. Boller, F. Bijkerk
Proceedings of SPIE, Vol. 8139, 81390Q, 2011. DOI: 10.1117/12.892687.
Nanostructured Polymer Brushes by UV-Assisted Imprint Lithography and Surface-Initiated Polymerization for Biological Functions
E. M. Benetti, C. Acikgöz, X. Sui, B. Vratzov, M. A. Hempenius, J. Huskens, G. J. Vancso
Advanced Functional Materials, 21(11), 2088–2095, 2011. DOI: 10.1002/adfm.201002569.
High-quality global hydrogen silsesquioxane contact planarization for nanoimprint lithography
S. Büyükköse, B. Vratzov, W. G. van der Wiel
Journal of Vacuum Science & Technology B, 29(2), 021602, 2011. DOI: 10.1116/1.3562939.
A common gate thin film transistor on poly(ethylene naphthalate) foil using step-and-flash imprint lithography
P. F. Moonen, B. Vratzov, W. T. T. Smaal, G. H. Gelinck, M. Péter, E. R. Meinders, J. Huskens
Organic Electronics, 12(12), 2207–2214, 2011. DOI: 10.1016/j.orgel.2011.09.020.
Nanoscale patterning by UV nanoimprint lithography using an organometallic resist
C. Acikgöz, B. Vratzov, M. A. Hempenius, D. N. Reinhoudt, G. J. Vancso, J. Huskens
ACS Applied Materials & Interfaces, 1, 2645–2650, 2009. DOI: 10.1021/am9005379.
Integration issues in step and repeat UV nanoimprint lithography
C. Charpin-Nicolle, M. Irmscher, M. Pritschow, B. Vratzov, H. van Vossen, J. Chiaroni, J. Massin, P. Gubbini
Proceedings of SPIE, Vol. 6921, 69212I, 2008. DOI: 10.1117/12.790732.
Template manufacturing for nanoimprint lithography using existing infrastructure
M. Irmscher, J. Butschke, F. Letzkus, H. Sailer, A. Schwersenz, G. Hess, M. Renno, H. Schulz, E. Thompson, B. Vratzov
Proceedings of SPIE, Vol. 5992, 59922E, 2005. DOI: 10.1117/12.629974.
Electrical Characterization of 12 nm EJ-MOSFETs on SOI Substrates
W. Henschel, T. Wahlbrink, Y. M. Georgiev, M. Lemme, T. Mollenhauer, B. Vratzov, A. Fuchs, H. Kurz, M. Kittler, F. Schwierz
Solid-State Electronics, 48, 739–745, 2004. DOI: 10.1016/j.sse.2003.09.037.
Triple-gate metal-oxide-semiconductor field effect transistors fabricated with interference lithography
M. C. Lemme, C. Moormann, H. Lerch, M. Möller, B. Vratzov, H. Kurz
Nanotechnology, 15(4), S208–S210, 2004. DOI: 10.1088/0957-4484/15/4/016.
Wafer scale patterning by soft UV-nanoimprint lithography
U. Plachetka, M. Bender, A. Fuchs, B. Vratzov, T. Glinsner, F. Lindner, H. Kurz
Microelectronic Engineering, 73–74, 167–171, 2004. DOI: 10.1016/j.mee.2004.02.035.
High resolution lithography with PDMS molds
M. Bender, U. Plachetka, J. Ran, A. Fuchs, B. Vratzov, H. Kurz, T. Glinsner, F. Lindner
Journal of Vacuum Science & Technology B, 22(6), 3229–3232, 2004. DOI: 10.1116/1.1824057.
Interferometric in situ alignment for UV-based nanoimprint
A. Fuchs, B. Vratzov, T. Wahlbrink, Y. Georgiev, H. Kurz
Journal of Vacuum Science & Technology B, 22(6), 3242–3245, 2004. DOI: 10.1116/1.1808735.
Large scale ultraviolet-based nanoimprint lithography
B. Vratzov, A. Fuchs, M. Lemme, W. Henschel, H. Kurz
Journal of Vacuum Science & Technology B, 21(6), 2760–2764, 2003. DOI: 10.1116/1.1627816.
Fabrication of 12 nm electrically variable shallow junction metal-oxide-semiconductor field effect transistors on silicon on insulator substrates
W. Henschel, T. Wahlbrink, Y. M. Georgiev, M. Lemme, T. Mollenhauer, B. Vratzov, A. Fuchs, H. Kurz
Journal of Vacuum Science & Technology B, 21, 2975–2979, 2003. DOI: 10.1116/1.1621670.
UV-NIL: Ein hochauflösendes Lithographieverfahren für die Nanotechnologie
Boris Vratzov
Shaker Verlag, Aachen, 2003. ISBN 3-8322-1347-3.
Fabrication of nanostructures using a UV-based imprint technique
M. Bender, M. Otto, B. Hadam, B. Vratzov, B. Spangenberg, H. Kurz
Microelectronic Engineering, 53, 233–236, 2000.
Conference presentations and posters
Broadband spectrometer development based on high-density free-standing transmission gratings
M. Bayraktar, F. Liu, H. M. J. Bastiaens, C. Bruineman, B. Vratzov, F. Bijkerk
Poster, ASML Networking Event, Veldhoven, Netherlands, 2018.
Broadband spectrometer development based on high-density free-standing transmission gratings
M. Bayraktar, F. Liu, H. M. J. Bastiaens, C. Bruineman, B. Vratzov, F. Bijkerk
Poster, 304th PTB-Seminar VUV and EUV Metrology, Berlin, Germany, 2017.
A wide band transmission mode spectrometer for diagnosis of EUV sources
J. L. P. Barreaux, M. Bayraktar, H. M. J. Bastiaens, C. Bruineman, B. Vratzov, F. Bijkerk
Poster, International Symposium on Extreme Ultraviolet Lithography, Maastricht, Netherlands, 2015.
Transmission grating spectroscopy in the EUV and VUV
H. M. J. Bastiaens, C. Bruineman, B. Vratzov, E. Louis, F. Bijkerk
Poster, Sematech, Toyama, Japan, 2013.
Transmission grating spectrometer for EUV source characterization from the UV to the EUV
H. M. J. Bastiaens, C. Bruineman, B. Vratzov, F. Bijkerk
Conference contribution, International Symposium on Extreme Ultraviolet Lithography, Toyama, Japan, 2013.
High line density free-standing transmission gratings for EUV and VUV emission spectroscopy
H. M. J. Bastiaens, R. van der Meer, B. Vratzov, F. Bijkerk
Conference contribution, International Symposium on Extreme Ultraviolet Lithography, Brussels, Belgium, 2012.
Advantages of UV-NanoImprint Lithography and dual-source dry etching for novel applications
R. van der Meer, B. Krishnan, I. V. Kozhevnikov, M. J. de Boer, B. Vratzov, H. M. J. Bastiaens, J. Huskens, G. P. M. Roelofs, P. V. Santos, W. G. van der Wiel et al.
MicroNano Conference, Ede, Netherlands, 2012.
Etching of W/Si multilayer mirrors for the fabrication of lamellar multilayer gratings
R. van der Meer, B. Krishnan, I. V. Kozhevnikov, M. J. de Boer, B. Vratzov, H. M. J. Bastiaens, J. Huskens, W. G. van der Wiel, P. E. Hegeman, G. C. S. Brons et al.
Oral presentation, Micro and NanoEngineering, Toulouse, France, 2012.
Reduced bandwidths for soft x-ray reflection using lamellar multilayer gratings
R. van der Meer, B. Krishnan, I. V. Kozhevnikov, M. J. de Boer, B. Vratzov, H. M. J. Bastiaens, J. Huskens, W. G. van der Wiel, P. E. Hegeman, G. C. S. Brons et al.
24th Symposium Plasma Physics and Radiation Technology, Lunteren, Netherlands, 2012.
Improved resolution for x-ray spectroscopy: single order operation of lamellar multilayer gratings
R. van der Meer, I. V. Kozhevnikov, B. Krishnan, J. Huskens, M. J. de Boer, P. E. Hegeman, G. C. S. Brons, H. M. J. Bastiaens, K. J. Boller, F. Bijkerk
EOS Topical Meeting on Diffractive Optics, Delft, Netherlands, 2012.
Improved resolution for soft-x-ray monochromatization using lamellar multilayer amplitude gratings
R. van der Meer, B. Krishnan, I. V. Kozhevnikov, M. J. de Boer, B. Vratzov, H. M. J. Bastiaens, J. Huskens, W. G. van der Wiel, K. J. Boller, F. Bijkerk
Poster, 23rd NVV-Symposium Plasma Physics & Radiation Technology, Lunteren, Netherlands, 2011.
Improved resolution for soft-x-ray monochromatization using lamellar multilayer amplitude gratings
R. van der Meer, B. Krishnan, I. V. Kozhevnikov, M. J. de Boer, B. Vratzov, H. M. J. Bastiaens, J. Huskens, W. G. van der Wiel, K. J. Boller, F. Bijkerk
Poster, Netherlands MicroNanoConference, Ede, Netherlands, 2011.
Improved resolution for soft X-ray monochromatization using lamellar multilayer gratings
R. van der Meer, B. Krishnan, I. V. Kozhevnikov, M. J. de Boer, B. Vratzov, H. M. J. Bastiaens, J. Huskens, W. G. van der Wiel, P. E. Hegeman, G. C. S. Brons, K. J. Boller, F. Bijkerk
Poster, SPIE Optics & Photonics, 2011.
Fabrication of lamellar multilayer gratings using UV-NIL and modified Bosch etching
R. van der Meer, B. Krishnan, I. V. Kozhevnikov, B. Vratzov, H. M. J. Bastiaens, J. Huskens, W. G. van der Wiel, K. J. Boller, F. Bijkerk
Poster, Netherlands MicroNanoConference, 2010.
Lamellar multilayer amplitude gratings as dispersive elements in the soft x-ray region
R. van der Meer, B. Krishnan, I. V. Kozhevnikov, B. Vratzov, H. M. J. Bastiaens, J. Huskens, W. G. van der Wiel, K. J. Boller, F. Bijkerk
Poster, 22nd NNV-Symposium on Plasma Physics & Radiation Technology, 2010.
Integration Issues in Step and Repeat UV Nanoimprint Lithography
C. Charpin-Nicolle, J. Chiaroni, J. Massin, M. Irmscher, B. Vratzov, H. van Vossen, P. Gubbini
6th International Conference on Nanoimprint and Nanoprint Technology, 2007.
Interferometric in-situ alignment for UV-based Nanoimprint
A. Fuchs, B. Vratzov, T. Wahlbrink, Y. Georgiev, H. Kurz
EIPBN, San Diego, USA, 2004.
High Resolution Lithography with PDMS Molds
M. Bender, U. Plachetka, J. Ran, A. Fuchs, B. Vratzov, H. Kurz
EIPBN, San Diego, USA, 2004.
Large scale homogeneity of UV based Nanoimprint
A. Fuchs, B. Vratzov, M. Lemme, W. Henschel, H. Kurz
First International Conference on Nanoimprint and Nanoprint Technology, San Francisco, USA, 2002.
UV-Nanoimprint Lithography: a promising alternative
H. Kurz, B. Vratzov, A. Fuchs, B. Spangenberg, M. Bender, M. Otto
International Workshop on NanoImprint Lithography, Lund, Sweden, 2002.
Prospects of cold UV-Nanoimprint Lithography
B. Vratzov, A. Fuchs, H. Kurz, M. Bender, M. Otto, B. Spangenberg
7th Mel_ARI/NID Workshop, Barcelona, Spain, 2001.
Acknowledgments and technical support
Optical recordings of synaptic vesicle fusion reveal diffusional dispersion
J. Lehrich et al.
bioRxiv preprint, 2025.
Acknowledged support: structured silicon wafers for µCP stamp fabrication.
Patterning Lead Zirconate Titanate Nanostructures at Sub-200-nm Length Scales
ACS Applied Materials & Interfaces, 2009.
Acknowledged support: silicon master fabrication.
Squeeze time investigations for step and flash imprint lithography
S. F. Wuister, J. H. Lammers, Y. W. Kruijt-Stegeman, L. van der Tempel, F. Dijksman
Microelectronic Engineering, 86(4–6), 681–683, 2009.
Acknowledged support: squeeze-experiment support for step-and-flash imprint lithography.
Poly(ferrocenylsilanes) as resists in nanofabrication
C. Acikgöz, M. A. Hempenius, X. Y. Ling, J. Huskens, G. J. Vancso
Polymer Preprints, 50(2), 324–325, 2009.
Acknowledged support: technical support and advice for UV nanoimprint lithography experiments.
Controlled polymer nanostructures by alternative lithography
C. Acikgöz
PhD thesis, University of Twente, 2010.
Acknowledged support: technical support connected to alternative lithography and polymer nanostructuring.
Characterization and application of a UV-based imprint technique
M. Otto, M. Bender, B. Hadam, H. Kurz
Microelectronic Engineering, 57–58, 361–366, 2001.
Acknowledged support: fabrication support related to UV-based imprint techniques.
Quasiparticles in graphene and other 2D materials
R. S. Fandan
PhD thesis, Universidad Politécnica de Madrid.
Acknowledged support: NIL-related technical support.
Reference projects and collaborations
Additional customer projects, partner relationships and development activities may not be shown due to confidentiality or non-disclosure requirements.
MESA+ Institute for Nanotechnology / University of Twente
Research collaboration and infrastructure-related activities in nanotechnology, cleanroom-based fabrication, nanoelectronics, EUV and vacuum ultraviolet optical components, nanoimprint-related processing and device-oriented development.
AMO GmbH / AMICA cleanroom environment
Long-standing connection with nanofabrication, nanoimprint lithography, advanced cleanroom technology and process-oriented micro- and nanotechnology development.
PROFACTOR GmbH
Several collaborations in prototyping, process development, patterning technologies and nanoimprint-based fabrication for advanced micro- and nanoscale applications.
EV Group / EVG
Collaboration in nanoimprint lithography, process development and advanced patterning technologies.
CEA-Leti
Process development activities related to advanced micro- and nanofabrication, technology implementation and application-oriented fabrication routes.
Philips
Technology development and prototyping activities for advanced fabrication, device-oriented concepts and application-driven high-tech solutions.
Sony
Technology development and prototyping activities involving advanced fabrication, functional structures and device-oriented innovation.
Caliopa
Technology development and prototyping activities related to advanced device concepts, fabrication routes and application-oriented technology implementation.
Max Born Institute, Berlin
Process development and prototyping activities involving advanced fabrication, structured samples and research-driven technology applications.
SCAPA / University of Strathclyde
Process development and prototyping activities related to advanced fabrication, patterning and application-oriented research.
Technical University Sofia
Process development and prototyping activities for advanced technology projects, fabrication support and research-oriented implementation.
Leibniz Universität Hannover
Process development and prototyping activities involving micro- and nanoscale fabrication, device-oriented structures and application-driven research.
Universität Stuttgart
Process development and prototyping activities related to advanced fabrication, functional structures and research-driven technology projects.
Universitätsklinikum Münster
Process development and prototyping activities for bio- and medical technology applications, structured samples and device-oriented concepts.
WWU Münster / CeNTech
Process development and prototyping activities in nanotechnology, advanced materials, structured surfaces and application-oriented research.
PDI Berlin
Process development and prototyping activities involving advanced materials, nanofabrication, device-oriented structures and research-driven technology implementation.
Discuss your technology project
Contact NT&D to explore how expert experience in nanotechnology, advanced fabrication know-how and device-oriented development expertise can support your project.